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Atom Lithography of Fe

Bart Smeets

Eindhoven University of Technology, The Netherlands

Thursday 16th June 2005, 3.30PM, Seminar Room AR103, Graduate Research Centre.

Atom lithography has been used for more than a decade to write periodic nanostructures on a surface by focusing an atomic beam with a standing light wave. This technique was first proven successfully on Na and Cr. Nowadays, researchers are trying to produce nanostructures with technologically interesting elements, like Ga, In, Si, and Fe. The atom optics group at the Eindhoven University of Technology in The Netherlands has opted for Fe because of its ferromagnetic properties. Fe nanolines have been grown with a pitch of 186 nm, a FWHM of 50 nm, and a height up to 10 nm. Further research will go in the direction of structured doping, with interesting applications in spintronics and the growth of magnonic crystals.

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