Provider: John Wiley & Sons, Ltd Content:text/plain; charset="UTF-8" TY - JOUR A1 - Zheng, Xiaorui A1 - Jia, Baohua A1 - Chen, Xi A1 - Gu, Min T1 - In Situ Third-Order Nonlinear Responses During Laser Reduction of Graphene Oxide Thin Films Towards On-Chip Nonlinear Photonic Devices JF - Advanced Materials JA - Adv. Mater. SN - 1521-4095 UR - http://dx.doi.org/10.1002/adma.201304681 DO - 10.1002/adma.201304681 SP - n/a EP - n/a KW - third-order nonlinear responses KW - graphene oxide thin films KW - laser-induced reduction PY - 2014 Y1 - 2014/03/01 ER -